Simply the best AFM for
automatic defect review
and surface roughness
measurement
The task of identifying nanoscale defects is a very
time consuming process for engineers working with
media and flat substrates. Park NX-HDM is an atomic
force microscopy system that speeds up the defect
review process by an order of magnitude through
automated defect identification, scanning and
analysis. Park NX-HDM links directly with a wide
range of optical inspection tools, thus significantly
increasing the automatic defect review throughput.
In addition, Park NX-HDM provides accurate sub-angstrom
surface roughness measurements, scan after scan.
Park NX-HDM, together with its industry's
lowest noise floor, and its unique True Non-Contact™
technology, it is the most accurate AFM for surface roughness
measurement in the market.
Automatic Defect Review for Media
and Substrates
- Fast defect imaging in non-contact mode
- Automated survey scan of defects mapped by optical inspection tools
- Automated zoom-in scan of specified defects
- Automated analysis of imaged defect types
- Links to a wide range of automated optical inspection (AOI) tools
Accurate Sub-Angstrom Surface
Roughness Measurement
- Automated surface roughness measurements for media and substrates
- Industry’s lowest system noise of less than 0.5 angstrom rms
- Immunity from parameter-dependent results by True Non-Contact™ technology
- True Non-Contact™ maintains accuracy without degradation in scan resolution
- Automatic tip exchange module (optional)
Cost Savings with True Non-Contact™
Mode
- 10 times or longer tip life during general purpose and defect imaging than any other AFMs
- Minimal tip wear from prolonged high-quality scans
- Minimized sample damage or modification
Accurate AFM Topography with Low
Noise Z Detector
- True Sample Topography™ without edge overshoot or piezo creep error
- Accurate surface height recording, even during high-speed scanning
- Industry leading forward and backward scan gap of less than 0.15%